Ionization radiation imageable photopolymer compositions

G - Physics – 03 – F

Patent

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Details

G03F 7/027 (2006.01) G03C 9/08 (2006.01) G03F 7/00 (2006.01) G03F 7/004 (2006.01) G03F 7/038 (2006.01)

Patent

CA 2341978

This invention discloses compositions that can be polymerized/crosslinked imagewise upon exposure to ionization radiation such as x-ray, electron beam, ion beam, and gamma-ray. This invention also discloses methods of use for these compositions for microfabrication of ceramics, for stereolithography, and for x-ray, e-beam, and ion-beam lithography which can be used for photoresists.

La présente invention concerne des compositions capables d'être polymérisées/réticulées pour permettre la formation d'images par exposition à un rayonnement ionisant tel qu'un rayon X, un faisceau électronique, un faisceau ionique, et un rayon gamma. La présente invention concerne des techniques d'utilisation de ces compositions dans la microfabrication d'objets en céramique, la stéréolithographie et comme photorésist dans la lithographie par rayon X, par faisceau électronique et par faisceau ionique.

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