Ir- and uv-radiation-sensitive composition and lithographic...

Details Ir- and uv-radiation-sensitive composition and lithographic... Ir- and uv-radiation-sensitive composition and lithographic...

G - Physics

03

F

G03F 7/023 (2006.01) B41C 1/10 (2006.01) B41M 5/36 (2006.01) G03F 7/022 (2006.01)

Patent

CA 2271834

An IR- and UV-radiation-sensitive composition comprising a diazo resin, a diazo ester, at least one novolac resin and an IR-ray absorber. A lithographic plate comprising a support coated with the said photosensitive composition.

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