C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
C07C 211/58 (2006.01) A61K 31/135 (2006.01) A61K 31/40 (2006.01) A61K 31/495 (2006.01) A61K 31/535 (2006.01) C07C 211/29 (2006.01) C07C 211/36 (2006.01) C07C 217/58 (2006.01) C07D 207/14 (2006.01) C07D 295/13 (2006.01) C07D 451/02 (2006.01) C07D 498/08 (2006.01)
Patent
CA 2196370
Isoprene derivatives of formula (I) (see fig. I) wherein m is an integer of 0 to 3, n is an integer of 5 to 12, A is cyclo(C3-C6)alkylene, phenylene, fluorenylene, pyrrolidinylene, piperazinylene, 9-aza-3-oxabicyclo[3.3.1]- nonylene, R1 and R2 are each independently benzyl, of which a phenyl ring may be substituted by 1 to 5 substituents selected from the group consisting of hydroxy, (C1-C4)alkyl, (C1-C4)alkoxy and halogen, X is a single bond or a divalent radical of -(CH2)pNH-, p is an integer of 0 to 3, or a pharmaceutically acceptable salt thereof. Those compounds are useful as multidrug resistance inhibitors for overcoming multidrug resistance of cancer and agents for enhancing an activity of anti-cancer agents.
Dérivés de l'isoprène de formule (I) (voir fig. I) où m est un entier de 0 à 3, n est un entier de 5 à 12, A est un cyclo(C3-C6)alkylène, un phénylène, un fluorénylène, un pyrrolidinylène, un pipérazinylène, un 9-aza-3-oxabicyclo[3.3.1]- nonylène, R1 et R2 sont chacun indépendamment du benzyle, dont un noyau phényle peut avoir 1 à 5 substituants choisis parmi l'ensemble constitué des groupes hydroxy, alkyle (C1-C4), alcoxy (C1-C4) et halogène, X est une liaison simple ou un radical divalent de -(CH2)pNH-, p est un entier de 0
Ikemoto Hiroyuki
Inomata Kohei
Inoue Hitoshi
Kawamura Kouji
Kishiye Takao
Nisshin Flour Milling Co. Ltd.
Ogilvy Renault Llp/s.e.n.c.r.l.,s.r.l.
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