C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
260/593.5, 260/6
C07C 53/21 (2006.01) G03C 1/85 (2006.01)
Patent
CA 1128548
ABSTRACT Isopropylbenzene derivatives having the general formula: Image in which R1 to R4 independently represent a hydrogen atom or a lower alkyl group having up to 4 carbon atoms, X? represents COO? or SO3?, and Rf, represents a fluorinated organic radical. The compounds may be applied to surfaces liable to be or become negatively charged to suppress spark discharges from such surfaces. Those compounds in which at least two of R2, R3 and R4 are alkyl, are particularly useful in the top coat of photographic films to eliminate marks caused by spark discharges.
327667
Newman Stephen
Stevens John
Minnesota Mining And Manufacturing Company
Smart & Biggar
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