Jet plasma deposition process and apparatus

Details Jet plasma deposition process and apparatus Jet plasma deposition process and apparatus

C - Chemistry, Metallurgy

23

C

C23C 16/50 (2006.01) C23C 4/04 (2006.01) C23C 4/12 (2006.01) C23C 16/26 (2006.01) C23C 16/513 (2006.01) H01J 37/32 (2006.01)

Patent

CA 2196301

A process and apparatus (10) for the plasma deposition of a carbon-rich coating onto a substrate (75) is provided. This method includes the steps of providing a substrate (75) in a vacuum chamber, and generating a carbon-rich plasma (160) in the vacuum chamber by injecting a plasma gas into a hollow cathode slot system (40) containing a cathode made of two electrode plates arranged parallel to each other, providing a sufficient voltage to create and maintain a carbon-rich plasma (160) in the hollow cathode slot system (40), and maintaining a vacuum in the vacuum chamber sufficient for maintaining the plasma (160). The plasma is deposited on the substrate to form a carbon-rich coating.

L'invention se rapporte à un procédé et à un appareil (10) de dépôt au plasma d'un revêtement riche en carbone sur un substrat (75). Ce procédé consiste à prévoir un substrat dans une chambre à vide, et à générer un plasma riche en carbone (160) dans la chambre à vide par injection d'un gaz de plasma dans un système de fente à cathode creuse (40) renfermant une cathode constituée de deux plaques électrolytiques parallèles, à produire une tension suffisante pour créer et maintenir un plasma riche en carbone (160) dans le système de fente à cathode creuse (40), et à conserver un vide dans la chambre à vide suffisant pour maintenir le plasma (160). Le plasma est déposé sur le substrat pour former un revêtement riche en carbone.

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