C - Chemistry – Metallurgy – 07 – F
Patent
C - Chemistry, Metallurgy
07
F
402/9
C07F 7/08 (2006.01) C07F 7/12 (2006.01) C08G 77/60 (2006.01)
Patent
CA 1300796
- 19 - ABSTRACT OF THE DISCLOSURE There is here disclosed a ladder polysilane represented by the general formula (I): Image (I) wherein n is a positive integer, and R is a halogen atom, a hydrogen atom, a hydroxyl group, an alkyl group, an alkenyl group, an aryl group or an alkoxy group having 20 or less carbon atoms, and the alkyl, alkenyl, aryl or alkoxy group may contain a functional group such as -COOH, -SO3H, -NH2, -NO2, -NCO, -F, -Cl, -Br, -I or -OH. In addition, a method for preparing the aforesaid ladder polysilane is also disclosed here.
568285
Matsumoto Hideyuki
Nagai Yoichiro
Matsumoto Hideyuki
Mitsui Toatsu Chemicals Inc.
Nagai Yoichiro
Sim & Mcburney
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