Large area, homogeneous array fabrication including...

G - Physics – 03 – F

Patent

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G03F 7/00 (2006.01) G01Q 60/00 (2010.01)

Patent

CA 2750425

Improved methods for loading arrays of tips with a material for subsequent deposition of the material from the tip to the substrate. Tip loading can be done by controlled vapor deposition which reduces the amount of non-specific material deposition onto a substrate. Improved nanoscale and microscale engineering and lithography can be achieved. Applications include better cellular studies including stem cell studies and stem cell differentiation control.

L'invention concerne des procédés améliorés pour la charge de matrices de pointes avec un matériau pour un dépôt ultérieur de matériel depuis la pointe sur le substrat. La charge de pointe peut être réalisée par dépôt en phase vapeur contrôlé qui réduit la quantité de dépôt de matériau non spécifique sur un substrat. Cela permet de réaliser des conceptions et lithographies nanoscopiques et microscopiques. Les applications comprennent de meilleures études cellulaires comprenant les études des cellules souches et le contrôle de différentiation des cellules souches.

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