C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
C23C 16/00 (2006.01) H01J 37/32 (2006.01)
Patent
CA 2304224
A microwave apparatus for sustaining a substantially uniform plasma over a relatively large area. The microwave apparatus comprises a vacuum vessel for sustaining the plasma in a plasma region thereof. The apparatus further comprises a nonevanescent microwave applicator having means for controlling the cutoff frequency thereof. The microwave applicator may comprise a waveguide and a volume of dielectric material disposed within the waveguide. Alternately, the microwave applicator may comprise ridge waveguide.
L'invention concerne un appareil hyperfréquence permettant de créer un plasma sensiblement uniforme sur une surface relativement étendue. L'appareil hyperfréquence comprend un récipient à vide destiné au dépôt du plasma dans une zone à plasma du récipient. L'appareil comprend également un applicateur hyperfréquence non évanescent comportant un dispositif de commande de sa fréquence de coupure. L'applicateur hyperfréquence peut comprendre un guide d'ondes et un volume de matière diélectrique disposé à l'intérieur du guide d'ondes. Dans un autre mode de réalisation, l'applicateur hyperfréquence peut comprendre un guide d'ondes à nervure.
Energy Conversion Devices Inc.
Macrae & Co.
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