G - Physics – 03 – F
Patent
G - Physics
03
F
G03F 7/20 (2006.01) H01L 21/02 (2006.01)
Patent
CA 2709718
Embodiments of the invention relate to methods and apparatus useful in the nanopatterning of large area substrates, where a rotatable mask is used to image a radiation- sensitive material. Typically the rotatable mask comprises a cylinder. The nanopatterning technique makes use of Near-Field photolithography, where the mask used to pattern the substrate is in dynamic contact with the substrate. The Near-Field photolithography may make use of an elastomeric phase-shifting mask, or may employ surface plasmon technology, where a rotating cylinder surface comprises metal nano holes or nanoparticles.
L'invention concerne des procédés et un appareil utiles dans la formation de nanomotif sur des substrats de grande superficie, un masque rotatif étant utilisé pour imager un matériau sensible au rayonnement. Typiquement, le masque rotatif comprend un cylindre. La technique de formation de nanomotif utilise la photolithographie en champ proche, le masque utilisé pour former des motifs sur le substrat étant en contact dynamique avec le substrat. La photolithographie en champ proche peut utiliser un masque de déphasage élastomère, ou peut employer la technologie du plasmon de surface, une surface de cylindre rotative comprenant des nanotrous ou des nanoparticules en métal.
Kobrin Boris
Landau Igor
Volf Boris
Bereskin & Parr Llp/s.e.n.c.r.l.,s.r.l.
Kobrin Boris
Landau Igor
Rolith Inc.
Volf Boris
LandOfFree
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