Laser assisted thermal poling of silica based waveguides

G - Physics – 02 – F

Patent

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Details

G02F 1/035 (2006.01) G02F 1/355 (2006.01) G02F 1/383 (2006.01) G02F 1/365 (2006.01)

Patent

CA 2383534

A method of thermally poling a silica based waveguide (12) comprises exposing a region of the waveguide (12) to an electric field (for example, via capillary electrodes (22, 24) inserted into holes in the waveguide); directing a laser beam (18) into the region exposed to the electric field to effect localised heating of the region via direct absorption; and scanning the laser beam (18) over the region at a rate selected to avoid heating of the region above the glass transition temperature. Reversing the electric field while scanning the laser beam (18) allows the formation of periodic poled gratings. The waveguide (12) can comprise an optical fibre.

L'invention concerne un procédé de polarisation thermique d'un guide d'ondes (12) à base de silice. Ce procédé consiste à exposer une zone du guide d'ondes (12) à un champ électrique (par exemple, par l'intermédiaire d'électrodes capillaires (22, 24) insérées dans des orifices dans le guide d'ondes); à diriger un faisceau laser (18) dans la zone exposée au champ électrique de manière à réaliser un échauffement localisé de ladite zone par absorption directe; puis à balayer le faisceau laser (18) sur la zone à une vitesse choisie de manière à éviter de chauffer la zone à une température supérieure à la température de transition vitreuse. La conversion du champ électrique pendant le balayage du faisceau laser (18) permet la formation de mires périodiques polarisées. Le guide d'ondes (12) peut comprendre une fibre optique.

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