Laser chemical fabrication of nanostructures

C - Chemistry – Metallurgy – 09 – K

Patent

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C09K 11/59 (2006.01) B23K 26/00 (2006.01) B82B 3/00 (2006.01)

Patent

CA 2408483

Disclosed is a process for fabricating luminescent porous material, the process comprising pre-treating a substrate (e.g. crystalline silicon) with laser radiation (e.g from a Nd:YAG laser) in a predetermined pattern followed by exposing the irradiated substrate to a chemical stain etchant (e.g. HF:HNO3:H2O) to produce a luminescent nanoporous material. Luminescent porous material having a luminescence maximum greater than about 2100 meV may be produced by this method. Such nanoporous materials are useful in optoelectronic and other semiconductor devices.

On présente un procédé permettant de fabriquer un matériau poreux et luminescent, le procédé consistant à prétraiter un substrat (p. ex. du silicium cristallin) par rayonnement laser (p. ex. avec un laser Nd:YAG) d'une manière prédéfinie, puis à exposer le substrat irradié à un agent d'attaque chimique (p. ex. le HF:HNO3:H2O) afin d'obtenir un matériau nanoporeux luminescent. Cette méthode permet d'obtenir un matériau poreux luminescent de luminescence maximale supérieure à environ 2 100 meV. Ce genre de matériau peut être utilisé en optoélectronique et dans divers dispositifs semi-conducteurs.

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