Laser etching of transverse mode discrimination apertures on...

Details Laser etching of transverse mode discrimination apertures on... Laser etching of transverse mode discrimination apertures on...

G - Physics

02

B

G02B 5/08 (2006.01) B23K 26/06 (2006.01) G01C 19/66 (2006.01) H01S 3/08 (2006.01)

Patent

CA 2154726

A method of etching a mirror for use in laser applications. A protective layer is formed on the mirror. The mirror is then masked to provide an etch region. The ?tch region is then etched using an eximer laser. After etching, the protective layer is removed.

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