Laser pattern generation apparatus

Details Laser pattern generation apparatus Laser pattern generation apparatus

H - Electricity

01

L

356/192

H01L 21/42 (2006.01) G03F 7/20 (2006.01)

Patent

CA 1243427

ABSTRACT OF THE DISCLOSURE A laser pattern generation apparatus particularly suited for semiconductor applications. The laser beam is split into a plurality of beams and modulated with acousto-optic modulators. A rotating mirror having a plurality of facets causes the beam to scan the workpiece.

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