C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 251/24 (2006.01) C07D 239/26 (2006.01) C07D 401/10 (2006.01) C07D 405/10 (2006.01) C07D 413/10 (2006.01) C07F 7/10 (2006.01) C07F 9/6521 (2006.01) C08K 5/3462 (2006.01) C08K 5/3492 (2006.01) C08K 5/41 (2006.01) C08K 5/5313 (2006.01) C08K 5/54 (2006.01) G03C 1/815 (2006.01) G03C 7/392 (2006.01)
Patent
CA 2162645
The invention relates to compounds of the formula I Image (I) in which n is 1 or 2, A is CH or a nitrogen atom, and the other radicals R1 to R25 are as defined in claim 1. The compounds of the formula I can advantageously be employed for stabilizing organic material against the harmful effect of light, oxygen and/or heat.
Birbaum Jean-Luc
Rytz Gerhard
Toan Vien Van
Valet Andreas
Wurms Norbert
Ciba Specialty Chemicals Holding Inc.
Fetherstonhaugh & Co.
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