C - Chemistry – Metallurgy – 01 – G
Patent
C - Chemistry, Metallurgy
01
G
C01G 49/00 (2006.01) C01B 13/36 (2006.01) C01F 7/00 (2006.01) C01G 9/00 (2006.01) C01G 19/00 (2006.01) C08K 3/00 (2006.01) C08K 7/00 (2006.01) C08L 27/06 (2006.01)
Patent
CA 2195245
Lattice layer compounds have the general formula (I) LiaMeIIb- 2aMeIII2+a(OH)4+2bAn-2/n*mH2O, in which MeII stands for Mg, Ca, Zn and/or Sn2+, MeIII stands for Al and/or Fe3+; An- stands for a selected anion of n valence or for a mixture of anions, and the indices lie in the following ranges: 0 < a < (b-2)/2, 1 < b < 6 and m = 0 to 5, provided that b-2a > 2. Also disclosed is a process for producing these lattice layer compounds and halogenated polymer mass stabilisers containing these lattice layer compounds.
Des composés stratifiés réticulaires répondent à la formule générale (I) Li¿a?Me?II¿¿b-2a?Me?III¿¿2+a?(OH)¿4+2b?A?n-¿¿2/n?*mH¿2?O, dans laquelle Me?II¿ désigne Mg, Ca, Zn et/ou Sn?2+¿; Me?III¿ désigne Al et/ou Fe?3+¿; A?n-¿ désigne un anion sélectionné de valence n ou un mélange d'anions; et les indices sont compris dans les plages suivantes: 0 < a < (b-2)/2, 1 < b < 6 et m = 0 à 5, à condition que b-2a > 2. L'invention concerne également un procédé de production de ces composés stratifiés réticulaires et des stabilisateurs contenant ces composés stratifiés réticulaires pour masses polymères halogénées.
Dolleschal Klaus
Ebner Paul
Pacher Karoline
Schiller Michael
Summerer Christina
Dolleschal Klaus
Ebner Paul
Metallgesellschaft Aktiengesellschaft
Pacher Karoline
Robic
LandOfFree
Lattice layer compounds and halogenated polymer mass... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Lattice layer compounds and halogenated polymer mass..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lattice layer compounds and halogenated polymer mass... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1719403