Layer-removal solution for photo-cross-linked photoresist...

Details Layer-removal solution for photo-cross-linked photoresist... Layer-removal solution for photo-cross-linked photoresist...

G - Physics

03

F

G03F 7/32 (2006.01) G03F 7/42 (2006.01)

Patent

CA 2119821

Abstract A layer-removal solution for photo-cross-linked and possibly thermally cross-linked photo- resist patterns and for solder stopping masks cross-linked by exposure and heating contains as essential constituents a diglycol monoalkylether, a glycol monoalkylether, an alkali metal hydroxide, water and additionally a water-soluble fluoride.

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