Lens array photolithography

Details Lens array photolithography Lens array photolithography

G - Physics

03

F

G03F 7/20 (2006.01)

Patent

CA 2306899

An apparatus and method for photolithographic exposure of a substrate including an illumination source for providing light for producing an image on the substrate, a mask including a pattern for projection onto the substrate, a lens assembly for projecting the light through a plurality of lens channels onto the substrate and an actuator for moving the lens assembly in a plane parallel to the mask and the substrate for suppressing interference effects.

L'invention concerne un appareil et un procédé d'exposition photolithographique d'un substrat, comportant une source lumineuse servant à fournir de la lumière en vue de produire une image sur le substrat, un masque comportant un motif destiné à être projeté sur le substrat, un ensemble lentilles servant à projeter la lumière par plusieurs canaux de lentilles sur le substrat, et un organe d'actionnement servant à déplacer l'ensemble lentilles dans un plan parallèle par rapport au masque et au substrat afin de supprimer des effets d'interférence.

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