C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
167/179, 260/629
C07C 69/12 (2006.01) A61K 31/557 (2006.01) C07C 33/14 (2006.01) C07C 59/46 (2006.01) C07C 59/48 (2006.01) C07C 69/732 (2006.01) C07C 405/00 (2006.01) C07D 309/30 (2006.01) C08B 37/16 (2006.01)
Patent
CA 2033187
Abstract: Compounds of formula (I) in which the residues Image (I) have the following meanings: a is (II) or (III); R1 is CH2OH, CH3, CF3, COOR5 with R5 or, A is a trans, trans-CH=CH-CH=CH- or tetramethylene group; B Image is an alkylene group with up to 10 C atoms; D is a di- rect bond, oxygen, sulphur, a -C=C- group or a (a) (II) (III) -CH=CR7-group, or (IV); B and D together are a di- rect bond; R2 and R3 are the same or different and de- note hydrogen or an organic acid residue with 1 to 15 C atoms; R1 and R2 together are a carbonyl group; R4 Image (IV)is a hydrogen atom or C1-10 alkyl, and, if R5 denotes a hydrogen atom, their salts with physiologically accept- able bases and their cyclodextrin clathrates.
Buchmann Bernd
Ekerdt Roland
Frohlich Wolfgang
Heindl Joseph
Skuballa Werner
Marks & Clerk
Schering Aktiengesellschaft
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