C - Chemistry – Metallurgy – 07 – H
Patent
C - Chemistry, Metallurgy
07
H
C07H 15/18 (2006.01) A61K 31/70 (2006.01) C07H 3/06 (2006.01) C07H 7/02 (2006.01) C07H 13/04 (2006.01) C07H 13/06 (2006.01) C07H 15/04 (2006.01) C07H 15/10 (2006.01) C08B 37/00 (2006.01)
Patent
CA 2157489
A Lewis-associated compound, represented by general formula (I), a process for producing the same, and an anti-inflammatory, wherein R1 and R3 represent each hydrogen, SO3H or CH2COOH: R2 represents hydrogen, SO3H, CH2COOH or N-acetyl-neutraminic acid residue; R4 represents hydrogen; R5 represents O-lower alkyl, O-lower alkenyl, O-ceramide residue, O-mannose residue, O-galactose residue or O-lactose residue; R6 represents acetylamine; and R7 and R3 represent each hydrogen. (1) Image
Endo Akira
Fujita Masamichi
Fujita Shuji
Iida Masami
Ishii Takayuki
Gowling Lafleur Henderson Llp
Mect Corporation
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