C - Chemistry – Metallurgy – 08 – G
Patent
C - Chemistry, Metallurgy
08
G
25/123, 402/7.2
C08G 79/08 (2006.01) C01B 6/10 (2006.01) C01B 35/00 (2006.01) C01B 35/14 (2006.01) C04B 35/632 (2006.01)
Patent
CA 1316289
Abstract New soluble preceramic polymers formed by reacting B10H14-nRn, (where R is a lower alkyl group having from 1 to about 8 carbon atoms, a substituted or unsubstituted cycloalkyl group having from 3 to about 8 carbon atoms, a substituted or unsubstituted lower alkenyl group having from 2 to about 8 carbon atoms, or a substituted or unsubstituted lower aryl group having from 6 to about 10 carbon atoms, and n is a number from zero to about six) with a diamine in an organic solvent are disclosed. Preferably the diamine has the formula R1R2N-R3-NR4R5 where R1, R2, R4 and R5 are H, a lower alkyl group having from 1 to about 8 carbon atoms, a substituted or unsubstituted cycloalkyl group having from 3 to about 8 carbon atoms, a substituted or unsubstituted lower alkenyl group having from 2 to about 8 carbon atoms, a substituted or unsubstituted lower aryl group having from 6 to about 10 carbon atoms, or a di- or triorganosilyl. R3 is a lower alkylene group having from 1 to about 8 carbon atoms, a substituted or unsubstituted cycloalkylene group having from 3 to about 8 carbon atoms, a substituted or unsubstituted lower alkenylene group having from 2 to about 8 carbon atoms, a substituted or unsubstituted lower arylene group having from 6 to about 10 carbon atoms, a substituted or unsubstituted polyarylene group, a heteratom-containing alkylene group, a heteroatom-containing cycloalkylene group, a heteratom- containing alkenylene group, or a heteroatom-containing arylene group A method of using Lewis base adducts of decaborane of the formula B10H12?n Rn?2L, where R and n are as defined above and L is any neutral Lewis base, can be used as binders for ceramic powders is also disclosed. And a method of using these Lewis base adducts as precursors in forming shaped ceramic bodies is also described.
570108
Rees William S. Jr.
Seyferth Dietmar
Massachusetts Institute Of Technology
Rees William S. Jr.
Seyferth Dietmar
Swabey Ogilvy Renault
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