Lift-off shadow mask

Details Lift-off shadow mask Lift-off shadow mask

H - Electricity

01

L

356/177

H01L 21/316 (2006.01) G03F 7/09 (2006.01) H01L 21/027 (2006.01) H01L 21/033 (2006.01)

Patent

CA 1187211

ABSTRACT A method for forming predetermined configuration of a film material comprises the steps of forming a layer of a first material on a surface, forming a layer of a second material on the first material wherein the first material has an etch rate greater than that of the second material when the first material and the second material are exposed to a common etchant, etching portions of the second material and underlying portions of the first material to expose portions of the surface, forming a layer of film material on the exposed portions of the surface, forming a layer of film material on the exposed portions of the surface and on the remaining portions of the second material, and removing the remaining portions of the first material such that the overlying second material and the film material thereon is also removed.

412219

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