Light-sensitive composition for the preparation of a...

Details Light-sensitive composition for the preparation of a... Light-sensitive composition for the preparation of a...

G - Physics

03

C

96/165

G03C 1/56 (2006.01) G03F 7/022 (2006.01)

Patent

CA 1267559

Abstract of the Disclosure A light-sensitive composition for the preparation of a positive acting photoresist which is a mixture of an alkali soluble resin and a light-sensitive component, said light- sensitive component consisting essentially of a compound of the formula Image wherein X is a naphthoquinone-(1,2)-diazide-(2)-sulfonyl residue.

502903

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