G - Physics – 03 – C
Patent
G - Physics
03
C
96/162, 96/200
G03C 1/52 (2006.01) G03C 1/72 (2006.01)
Patent
CA 1062073
Abstract of the Disclosure A light-sensitive coating composition and a light- sensitive photomechanical structure, such as a printing plate or a photoresist is produced by coating a suitable planar substrate with a condensation product of an organic i- socyanate and a polymeric resin having functional groups reactive with the isocyanate, such as phenol-formaldehyde resin, and a light-sensitive diazo compound, such as the esters and amides of quinone and naphthoquinone diazides, the coating being softenable by exposure to light and sub- sequent treatment with a conventional liquid printing plate developer, such as an aqueous alkaline solution and/or an organic solvent.
240375
American Hoechst Corporation
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