Light-sensitive compounds and photoresists containing the same

Details Light-sensitive compounds and photoresists containing the same Light-sensitive compounds and photoresists containing the same

C - Chemistry, Metallurgy

07

C

96/160, 402/268,

C07C 67/26 (2006.01) C08G 59/14 (2006.01) C08G 59/16 (2006.01)

Patent

CA 1044398

ABSTRACT This invention relates to low molecular weight light-sensitive polymeric substances and their preparation in which, in the presence of a common solvent, a mixture of p-azidobenzoic acid or an esterifiable deriva- tive thereof and a p-nitrobenzoic acid which may be substituted in the ortho- and/or meta-positions with an alkyl group containing from 1 to 4 carbon atoms, or an esterifiable derivative thereof are reacted with an epoxide resin. The products obtained have improved properties such as radiation sensitivity, light resolution and edge definition.

219615

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