G - Physics – 03 – C
Patent
G - Physics
03
C
96/165, 260/396.
G03C 1/56 (2006.01) G03F 7/022 (2006.01)
Patent
CA 1184565
Abstract of the Disclosure A light-sensitive copying material for the preparation of printing plates and photoresists is described, which material contains, as the light-sensitive compound, a napht',oquinone- diazide-sulfonic acid ester of the general formula I Image in which D is a 1,2-naphthoquinone-2-diazide-4-sulfonyl radical or a 12-naphthoquinone-2-diazide -5-sulfonyl radical, R1 is a hydrogen atom or a -COCnH2n+1 radical, and R2 is a hydrogen atom or a -CO-OCnH2n+1 radical, n being a number from 10 to 25 and the sum of the carbon atoms of R1 + R2 being n + 1. The new quinone-diazides are distinguished by a higher solubility and a greater resistance to developer.
387951
Fetherstonhaugh & Co.
Hoechst Aktiengesellschaft
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