Light-sensitive materials

C - Chemistry – Metallurgy – 08 – F

Patent

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C08F 20/32 (2006.01) C07C 45/00 (2006.01) C07C 47/24 (2006.01) C07C 57/42 (2006.01) C07C 59/68 (2006.01) C07C 205/56 (2006.01) C08F 8/46 (2006.01) C08F 20/26 (2006.01) C08F 20/36 (2006.01) G03C 1/74 (2006.01) G03F 7/038 (2006.01)

Patent

CA 1107444

ABSTRACT OF THE DISCLOSURE ? photopolymerisable material suitable for use in the production of lithographic printing plates comprises a polymer which includes a plurality of structural units represented by the Formula: Image in which R1 represents a hydrogen atom or methyl group; R2 represents hydrogen atom, an alkyl or substituted alkyl group, an aryl or substituted aryl group, or a heterocyclic or substituted heterocyclic group; R3, R4 and R5, which may be the same or different, each represents a hydrogen atom, a halogen atom, a cyano group, an alkyl group, an aryl group, an alkoxy group, an aryloxy group, an aralkyl group, an aralkoxy group or an alkoxy carbonyl group; Z represents a hydroxyl group, or an ester group and a is an integer greater than or equal to 1. The polymer may be produced by reacting a polymer of 2,3-epoxy propyl acrylate or 2,3-epoxy propyl methacrylate with an acid of formula R2-(CR3-CR4)??=C(OOH)2.

268315

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