Light-sensitive mixture and copying material comprising an...

Details Light-sensitive mixture and copying material comprising an... Light-sensitive mixture and copying material comprising an...

G - Physics

03

C

96/165, 260/396.

G03C 1/56 (2006.01) G03F 7/022 (2006.01)

Patent

CA 1213599

ABSTRACT OF THE DISCLOSURE A light-sensitive mixture comprising a light- sensitive naphthoquinone-diazide-sulfonic acid ester corresponding to the formula. Image I wherein D represents a 1,2-naphthoquinone-2-diazide-5- sulfonyl or -4-sulfonyl radical; R1, R2, R3, R1', R2' and R3' each represent hydrogen, halogen, alkyl groups having 1 to 4 carbon atoms or radicals of the formula DO and n represents an integer from 2 to 18; not more than three DO radicals in total being present on one benzene ring. The mixture is useful for preparing printing plates or photoresists.

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