Light-sensitive mixture based on o- naphthoquinonediazides,...

Details Light-sensitive mixture based on o- naphthoquinonediazides,... Light-sensitive mixture based on o- naphthoquinonediazides,...

G - Physics

03

C

96/165, 260/396.

G03C 1/54 (2006.01) G03F 7/022 (2006.01)

Patent

CA 1213600

Abstract of the Disclosure A light-sensitive mixture is described, which is specially intended for the production of planographic printing plates and which contains, as the light-sensitive compound, a naphthoqui- nonediazide sulfonic acid ester of the general formula I Image in which D is the 1, 2-naphthoquinone-2-diazide-5-sulfonyl radi- cal or the 1, 2-naphthoquinone-2-diazide-4-sulfonyl radical, preferably the 1,2-naphthoquinone-2-diazide-5-sulfonyl radical, R and R' are hydrogen atoms, alkyl groups having 1 to 4 carbon atoms or radicals of the formula DO, and n denotes an integer from 6 to 18, preferably from 8 to 14. The new compounds are distinguished by good solubility and produce layers which have a high resistance to alkaline developer solutions and to damping solution containing alcohol.

404463

Affiliated with

Also associated with

Rating

Light-sensitive mixture based on o- naphthoquinonediazides,... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Light-sensitive mixture based on o- naphthoquinonediazides,..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Light-sensitive mixture based on o- naphthoquinonediazides,... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1261241