Light source for reduced projection

H - Electricity – 01 – S

Patent

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H01S 3/08 (2006.01) H01S 3/098 (2006.01) H01S 3/225 (2006.01)

Patent

CA 1294352

ABSTRACT OF THE DISCLOSURE A reduced projection light source comprises a laser device for emitting laser light having a lateral mode of multimodes, and an etalon located between a chamber of the laser device and a total reflection mirror. The light source is used as an exposure light source for transfer printing a ultrafine pattern on a semiconductor wafer.

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