C - Chemistry – Metallurgy – 11 – D
Patent
C - Chemistry, Metallurgy
11
D
134/3.2
C11D 1/29 (2006.01) C11D 1/12 (2006.01) C11D 1/26 (2006.01) C11D 1/37 (2006.01) C11D 3/06 (2006.01)
Patent
CA 2002339
Abstract of the Disclosure A liquid cleaning composition having improved cleaning power Eor hard surfaces comprising from 0.02 to 40% by weight of an anionic surfactant mixture of a) sulphated hydroxyalkylpolyethylene- or hydroxyalkylpolypropylene glycol ethers of the following formula R1 CH(OSO3M)-CH(R3)-(OCBR4-CH2)n-OR2, wherein R1 = H or C116 alkyl, R2 = C122 alkyl, R3 = C116 alkyl or preferably H, R4 = -CH3 or preferably H, M = H, ammonium, alkylammonium, alkanolammonium (C14) or a monovalent metal atom, n = 0-20, and b) a dioctylsulphosuccinate in a wei.qht ratio of 1:10 to 10:1, as well as organic or inorganic builders. Advantageously, the composition contains a solubiliser such as toluene-, xylene- or cumenesulphonate, low molecular alcohol or short-chained fatty alcohol and, particularly, an ether of a C16 polyhydric alcohol in a weight ratio of surfactant to solubiliser of from 1:0 to 1:2, as well as other conventional ingredients such as a dyestuff, perfume, preservative and nonionic surfactant.
Jeschke Peter
Jost Frantisek
Kiewert Eva
Middelhauve Birgit
Schenker Gilbert
Borden Ladner Gervais Llp
Henkel Kommanditgesellschaft Auf Aktien
Jeschke Peter
Jost Frantisek
Kiewert Eva
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