C - Chemistry – Metallurgy – 11 – D
Patent
C - Chemistry, Metallurgy
11
D
C11D 1/94 (2006.01) C11D 1/02 (2006.01)
Patent
CA 2263981
The present invention relates to lamellar structured liquid cleansing compositions comprising 5 % to 50 % of a surfactant system comprising (a) an anionic or mixture of anionics and (b) an amphoteric and/or zwitterionic surfactant in mixture, wherein alkalimetal alkylamphoacetate comprises 25 % to 90 % of component (b). A method of enhancing low temperature stability of such lamellar structured liquid cleansing compositions by the selection of an alkalimetal alkylamphoacetate in an amount of 25 % to 90 % of the component (b ) is provided. Excellent low temperature stability is achieved.
La présente invention concerne des compositions de nettoyage liquides à structure lamellaire. Ces compositions comprennent 5 à 50 % d'un système tensioactif, comprenant (a) un anionique ou un mélange d'anioniques et (b) un tensioactif anionique amphotérique et/ou bipolaire en mélange, et l'alkylamphoacétate de métal alcalin comprend 25 à 90 % du composant (b). L'invention traite aussi d'un procédé pour augmenter la stabilité à basse température de ces compositions de nettoyage liquides à structure lamellaire par la sélection d'un alkylamphoacétate de métal alcalin à raison de 25 à 90 % du composant (b). On obtient ainsi une excellente stabilité à basse température.
Kolodziej Richard
Puvvada Sudhakar
Shana'a May
Bereskin & Parr Llp/s.e.n.c.r.l.,s.r.l.
Plc Unilever
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