C - Chemistry – Metallurgy – 25 – D
Patent
C - Chemistry, Metallurgy
25
D
C25D 3/02 (2006.01) C25D 3/56 (2006.01) C25D 3/66 (2006.01) H01G 9/155 (2006.01) H01M 4/00 (2006.01)
Patent
CA 2662714
When depositing a metal or a compound of the metal from a liquid crystal phase comprising a metal compound, e.g. a metal salt, by electrochemical means, high concentrations of the salt may be employed by using an ionic surfactant in place of the commonly used non-ionic surfactant.
Lors du dépôt d'un métal ou d'un composé métallique à partir d'une phase cristal liquide comprenant un composé métallique, tel qu'un sel métallique, par voie électrochimique, de fortes concentrations du sel peuvent être employées par utilisation d'un tensio-actif ionique à la place d'un tensio-actif non ionique généralement utilisé.
Kimber Jennifer
Peat Daniel
Marks & Clerk
Nanotecture Ltd
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