C - Chemistry – Metallurgy – 07 – F
Patent
C - Chemistry, Metallurgy
07
F
C07F 7/08 (2006.01) C07J 51/00 (2006.01) C09K 19/06 (2006.01) C09K 19/40 (2006.01)
Patent
CA 2084562
LIQUID CRYSTALS WITH (POLYSILA)ALKYL WING GROUPS Abstract of the Disclosure A compound of the general formula M-(CH2)n-(O)m-[-D-B-]q-Y, (I) in which M represents a silicon radical having 2 to 5 silicon atoms which are linked together by bridging elements A, and the remaining valencies of the silicon atoms are saturated with radicals R; A is a bridging element selected from the group consisting of C1- to C8-alkylene radicals and oxygen with the proviso that at least one radical A per M radical is a C1-to C8- alkylene radical; R represents optionally fluorine or chlorine atom- or cyano group-substituted straight-chain C1- to C10-alkyl or C2- to C10-alkenyl radicals, branched chain C3- to C10-alkyl or C3- to C10-alkenyl radicals, optionally C1- to C4-alkyl- C1- to C4-alkoxy radicals, fluorine, chlorine, bromine atom, cyano, trifluoromethyl or nitro radical substituted C6- to C12-cyclo- alkyl, C6- to C12- cycloalkenyl, C6- to C12-alkylcycloalkyl, C6- to C12-alkylcycloalkenyl, C6- to C12-aryl or C6- to C12-aralkyl radicals; n is an integer of from 3 to 12; m is 0 or 1; D repre- sents isocyclic or heterocyclic saturated or unsaturated 5- or 6-membered rings; B represents a linking group selected from the group consisting of a chemical bond, a -COO-, -OOC-, -CH2-CH2-, -CH=CH-, -C=C-, -CH=N-, -N=CH-, -CH2-O-, -O-CH2- and -N=N- group; q is an integer of from 1 to 3; Y is a hydrogen atom or a straight-chain or branched chain C1- to C10-alkyl or C1-to C10- alkoxy group or a radical D which is provided with a hydrogen atom or substituted, in which 1 or 2 ring substituents may be C1- to C4-alkyl, C1- to C4-alkoxy radicals, fluorine, chlorine or bromine atoms, cyano, trifluoromethyl or nitro radicals, or a cholesteryl radical. These compounds are liquid crystals and can be employed alone or in admixture with other liquid crystals.
Haeberle Norman
Kreuzer Franz-Heinrich
Krueger Benno
Zahn Ingo
Bereskin & Parr Llp/s.e.n.c.r.l.,s.r.l.
Consortium Fuer Elektrochemische Gmbh
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