C - Chemistry – Metallurgy – 11 – D
Patent
C - Chemistry, Metallurgy
11
D
C11D 1/825 (2006.01) C11D 3/20 (2006.01) C11D 3/36 (2006.01) C11D 3/37 (2006.01) C11D 3/43 (2006.01) C11D 17/04 (2006.01)
Patent
CA 2669625
The present invention relates a liquid composition, having a pH between 3 and 7, comprising a non ionic surfactant or a mixture thereof, an amine oxide or a mixture thereof, a glycol ether solvent, a chelant and a cationic polymer. An essential feature of this composition is that this composition does not contain any anionic surfactant. The present invention also encompasses a process of treating hard- surfaces, preferably delicates hard-surfaces located in bathrooms, wherein a liquid composition according to the present invention is applied onto said surfaces.
La présente invention porte sur une composition liquide, ayant un pH entre 3 et 7, comprenant un agent tensio-actif non ionique ou un mélange d'agents tensio-actifs non ioniques, un oxyde d'amine ou un mélange d'oxydes d'amines, un solvant de type éther de glycol, un chélatant et un polymère cationique. Une caractéristique essentielle de cette composition est que cette composition ne contient pas d'agent tensio-actif anionique. La présente invention porte également sur un procédé de traitement de surfaces dures, de préférence de surfaces dures délicates situées dans des salles de bain, procédé selon lequel une composition liquide selon la présente invention est appliquée sur lesdites surfaces.
Hermie Marina Jozefa
Riou Fabienne
Dimock Stratton Llp
The Procter & Gamble Company
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