Liquid personal cleanser with moisturizer

C - Chemistry – Metallurgy – 11 – D

Patent

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Details

C11D 17/08 (2006.01) C11D 9/24 (2006.01) C11D 9/26 (2006.01) C11D 9/48 (2006.01) A61K 7/50 (1995.01)

Patent

CA 2139666

A very stable mild dispersoidal liquid soap personal cleansing and moisturizing composition comprising: (A) from about 5 % to about 20 % by weight of potassium C8-C22 fatty acid soap; (B) from about 0.1 to about 7 % C8-C22 free fatty acid; (C) from about 35 % to about 70 % water; and (D) from about 8 % to about 35 % of a polyol selected from the group consisting of: glycerin, glycerol, propylene glycol, polypropylene glycols, polyethylene glycols, ethyl hexanediol, hexylene glycols, and other aliphatic alcohols; and mixtures thereof; (E) from about 0.5 % to about 5 % petrolatum; and (F) from about 0.5 to about 5 % glycol ester selected from the group consisting of glycol monoesters and diesters of fatty acids with a chain length from about 10 to about 22, and mixtures thereof.

Savon liquide doux très stable de type dispersoïde pour l'hygiène personnelle et composition hydratante constituée : A) d'environ 5 à environ 20 % en poids d'un savon de potassium d'acide gras à chaîne de type C8-C22; B) d'environ 0,1 à environ 7 % d'acide gras libre à chaîne de type C8-C22 ; C) d'environ 35 à environ 70 % d'eau et D) d'environ 8 à environ 35 % d'un polyol choisi parmi un groupe comprenant la glycérine, le glycérol, le propylèneglycol, des polypropylèneglycols, des polyéthylèneglycols, l'éthylhexanediol, des hexylèneglycols et d'autres alcools aliphatiques et mélanges de ceux-ci; E) d'environ 0,5 à environ 5 % de pétrolatum et F) d'environ 0,5 à environ 5 % d'ester glycolique choisi parmi un groupe comprenant des monoesters et des diesters glycoliques d'acides gras dont la longueur de chaîne est comprise entre environ 10 et environ 22, et des mélanges de ceux-ci.

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