Liquid personal cleansing compositions containing polyvalent...

C - Chemistry – Metallurgy – 11 – D

Patent

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C11D 17/08 (2006.01) C11D 1/94 (2006.01)

Patent

CA 2225617

The present invention relates to liquid personal cleansing compositions which are relatively low cost to prepare, but which exhibit excellent mildness and rinse feel properties. These compositions comprise from about 1 % to about 30 % of an anionic surfactant, from about 1 % to about 15 % of an amphoteric surfactant, from about 0.5 % to about 5 % of a polyvalent metal cation, water and from 0.1 % to about 30 % of a skin conditioner. The weight ratio of the anionic surfactant to the amphoteric surfactant ranges from about 4:1 to about 1:4. The viscosity of the liquid personal cleansing compositions of the present invention ranges from about 1,000 to about 50,000 cps.

L'invention porte sur des compositions de nettoyage liquides à usage personnel d'un coût de fabrication relativement bas, mais qui présentent d'excellentes propriétés de douceur et de sensation de rinçage. Ces compositions comprennent environ 1 à environ 30 % d'un tensioactif anionique, environ 1 à environ 15 % d'un tensioactif amphotère, environ 0,5 à environ 5 % d'un cation métallique polyvalent, de l'eau et environ 0,1 à environ 30 % d'une crème pour la peau. Le rapport pondéral entre le tensioactif anionique et le tensioactif amphotère s'échelonne d'environ 4/1 à environ 1/4. La viscosité des compositions de nettoyage liquides à usage personnel s'échelonne d'environ 1000 à environ 50000 cPs.

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