C - Chemistry – Metallurgy – 30 – B
Patent
C - Chemistry, Metallurgy
30
B
356/178
C30B 19/12 (2006.01) C30B 19/04 (2006.01) C30B 29/40 (2006.01) H01L 21/02 (2006.01)
Patent
CA 1204526
LIQUID PHASE EPITAXIAL GROWTH METHOD ABSTRACT OF THE DISCLOSURE In liquid phase epitaxial growth of a compound semiconductor layer on a substrate, an unsaturated solution is brought into contact with a solute source crystalline plate. The plate dissolves into the solution, which creates a supercooling condition in the solution without decrease of the solution temperature. The crystalline plate has a denser crystal face than that of the substrate, and/or the lattice constant of the crystalline plate is considerably different from that of the substrate.
426610
Isozumi Shoji
Kusunoki Toshihiro
Fujitsu Limited
Mcfadden Fincham
LandOfFree
Liquid phase epitaxial growth method does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Liquid phase epitaxial growth method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Liquid phase epitaxial growth method will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1333031