Liquid photoimageable resist

Details Liquid photoimageable resist Liquid photoimageable resist

G - Physics

03

F

G03F 7/004 (2006.01) G03F 7/031 (2006.01) G03F 7/26 (2006.01) H05K 3/00 (2006.01)

Patent

CA 2158915

A liquid applied photoresist composition is disclosed which exhibits a favorable balance of photospeed and overall physical properties. The photoresist composition includes a binder, a multifunctional monomer, a photoinitiator, and a solvent. The photoinitiator is present in the photoresist in an amount of greater than about 10% by weight of the photoresist without solvent. The photoresist when applied is relatively resistant to blocking when applied to a substrate. A process for producing a negative resist image on a surface using the photoresist is also disclosed.

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