G - Physics – 03 – F
Patent
G - Physics
03
F
G03F 7/038 (2006.01) C08J 5/00 (2006.01) C08L 63/00 (2006.01) G03F 7/00 (2006.01) G03F 7/027 (2006.01) G03F 7/20 (2006.01)
Patent
CA 2211628
A liquid, radiation-curable composition which in addition to a liquid, free- radically polymerizable component comprises at least the following additional components: (A) from 40 to 80 per cent by weight of a liquid difunctional or more highly functional epoxy resin or of a liquid mixture consisting of difunctional or more highly functional epoxy resins; (B) from 0.1 to 10 per cent by weight of a cationic photoinitiator or of a mixture of cationic photoinitiators; and (C) from 0.1 to 10 per cent by weight of a free-radical photoinitiator or of a mixture of free- radical photoinitiators; and (D) up to 40 per cent by weight of a hydroxy compound, in which composition component (D) is selected from the group consisting of: (D1) phenolic compounds having at least 2 hydroxyl groups, (D2) phenolic compounds having at least 2 hydroxyl groups, which are reacted with ethylene oxide, proplyene oxide or with ethylene oxide and propylene oxide, (D3) aliphatic hydroxy compounds having not more than 80 carbon atoms, (D4) compounds having at least one hydroxyl group and at least one epoxide group, and (D5) a mixture of at least 2 of the compounds mentioned under (D1) to (D4), and component (D) is present in the compositions in a quantity of at least 2 per cent by weight; the free-radically polymerizable component comprises at least (E) from 4 to 30 per cent by weight of at least one liquid poly(meth)acrylate having a (meth)acrylate functionality of more than 2; and at least one of components (A) and (D) comprises substances which have aromatic carbon rings in their molecule, is particularly suitable for stereolithography, a particular feature of this composition being that it leads to cured material which exhibits only a very low propensity for uptake of water.
Schulthess Adrian
Steinmann Bettina
Ciba Specialty Chemicals Holding Inc.
Fetherstonhaugh & Co.
Huntsman Advanced Materials (switzerland) Gmbh
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