Liquid radiation-curable formulation, in particular for use...

C - Chemistry – Metallurgy – 08 – G

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C08G 77/46 (2006.01) C09D 183/12 (2006.01) G03C 9/08 (2006.01) G03F 7/00 (2006.01) G03F 7/032 (2006.01) G03F 7/075 (2006.01)

Patent

CA 2117572

Liquid radiation-curable formation, in particular for stereolithography, based on at least one compound that contains radically polymerisable groups, and at least one photoinitiator suitable for the polymerisation, which formulation additionally contains a polyoxyalkylene- polysiloxane block copolymer that is selected from copolymers of the chemical formulae (I): R1-(OCcH2c)d-{[T]-(CcH2cO)d-l-(CcH2c)}-OR1 (see fig. I) and (see fig. II) wherein: R1 is a hydrogen atom or a C1-C8alkyl group; R2 is a methyl or phenyl group; [T] is a polysiloxane group [PS] terminated as described in the specification in more detail; [PS] is the group of formula (see fig. III) and [Alk] is an alkylene group of 3 to 10 carbon atoms, as well as novel block copolymers of formulae (I) and (II). The cured formulations have, inter alia, superior impact strength.

Formulation liquide photoréticulable, notamment pour stéréolithographie, à base d'au moins un composé renfermant des groupes polymérisables via les radicaux, et au moins un photo-initiateur pour la polymérisation. La formulation renferme de plus un copolymère à séquence de polyoxyalkylène-polysiloxane, choisi parmi des copolymères de formules chimiques (I) R1-(OCcH2c)d-{¢T!-(CcH2cO)d-l-(CcH2c)}-OR1 (voir fig. I) et (voir fig. II), où R1 est un atome d'hydrogène ou un groupe alkyle C1-C8; R2 est un groupe méthyle ou phényle; ¢T! est un groupe polysiloxane avec ¢PS! terminal, comme on le décrit plus en détail dans la description; ¢PS! est le groupe de formule (voir fig. III) et ¢Alk! est un groupe alkylène de 3 à 10 atomes de carbone; nouveaux copolymères séquencés de formules (I) et (II). Les formulations réticulées possèdent, entre autres propriétés, une résistance supérieure aux chocs.

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