C - Chemistry – Metallurgy – 11 – D
Patent
C - Chemistry, Metallurgy
11
D
134/34
C11D 7/36 (2006.01) C23G 1/00 (2006.01)
Patent
CA 1210663
ABSTRACT OF THE DISCLOSURE This invention relates to a liquid residue reducing composition. More particularly, this invention relates to a liquid residue reducing composition which comprises an aqueous solution containing an effective amount of octane-l- phosphonic acid or a water-soluble salt thereof and to the method of using said composition.
432731
Koch Ferdinand
Scharf Rolf
Schlussler Hans-Joachim
Henkel Kommanditgesellschaft Auf Aktien (henkel Kgaa)
Macrae & Co.
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