Lithographic developing process using an anionic material to...

Details Lithographic developing process using an anionic material to... Lithographic developing process using an anionic material to...

G - Physics

03

F

96/6, 101/61

G03F 7/08 (1980.01)

Patent

CA 1157308

ABSTRACT The disclosure describes a process for removing unexposed diazo from a lithographic printing plate comprising a silicated aluminum substrate having a hydrophilic, anionic, negatively charged surface and on and bonded to the substrate, a light sensitive, cationic, positively charged, water-soluble diazo material which has been selectively exposed to actinic light in an image area. The process comprises contacting the plate after exposure with a solution consisting essentially of an anionic material in water in a quantity and for a time sufficient to couple the diazo with the anionic material and dissolve the coupled product from the non-image area thereby overcoming the bond between the diazo and the substrate leaving a clean, hydrophilic non-image area, and rinsing with water.

363214

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