Lithographic process using a processing layer containing a...

Details Lithographic process using a processing layer containing a... Lithographic process using a processing layer containing a...

G - Physics

03

C

96/23, 96/252, 9

G03C 1/72 (2006.01) G03C 5/00 (2006.01) G03F 7/004 (2006.01)

Patent

CA 1166879

TAI, K. L. 2 LITHOGRAPHIC PROCESS AND RESULTING ARTICLE Abstract Lithographic fabrication of LSI's depends on inorganic resist to yield excellent edge acuity. Systems depend upon photomigration--of, e.g., silver--into a chalcogenide or other glass layer to insolubilize irradiated regions with respect to solvent development. Regulation of silver content and control of processing conditions result in a surface concentration gradient and concomitant lateral diffusion of silver to account for enhanced acuity.

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