Lithography apparatus using extreme uv radiation and having...

Details Lithography apparatus using extreme uv radiation and having... Lithography apparatus using extreme uv radiation and having...

G - Physics

03

F

G03F 7/20 (2006.01)

Patent

CA 2711616

A lithography apparatus (10) is disclosed using extreme UV radiation and hav-ing a hydrocarbon sorbing member comprising a getter material arranged in the process cham-ber (13) of said apparatus.

L'invention porte sur un appareil de lithographie (10) utilisant un rayonnement ultraviolet extrême et ayant un élément de sorption d'hydrocarbures comprenant un matériau getter agencé dans la chambre de traitement (13) dudit appareil.

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