Long persistent phosphor incorporated within a non-settable...

Details Long persistent phosphor incorporated within a non-settable... Long persistent phosphor incorporated within a non-settable...

C - Chemistry, Metallurgy

09

K

C09K 11/00 (2006.01) C03C 4/12 (2006.01) C03C 14/00 (2006.01) C09D 5/22 (2006.01) C09K 11/02 (2006.01)

Patent

CA 2393713

A process for incorporating a long persistent phosphor within a non-settable material includes firing a doped phosphor to obtain a phosphor having a persistence that ranges from minutes to hours. The fired phosphor is then ground into a phosphor particulate having a mean domain size. Typical particulate mean domain size ranges from 1 to 60 microns. The phosphor particulate is thereafter encapsulated within a water impervious coating material such as silicon oxide or fluoride. The coated phosphor particulate is then mixed in a specified volume ratio within the non-settable material. Typical formulation ratios range from 0.1 to 30 volume percent of particulate.

L'invention concerne un procédé permettant l'incorporation d'un phosphore à persistance élevée dans une matière non durcissable. Ce procédé consiste à chauffer un phosphore dopé afin d'obtenir un phosphore présentant une persistance allant de plusieurs minutes à plusieurs heures. On pulvérise ensuite ce phosphore cuit de manière à obtenir des particules de phosphore présentant une taille de domaines moyenne. Cette taille de domaines moyenne se situe normalement entre 1 et 60 microns. On encapsule ensuite ces particules de phosphore dans un matériau d'enrobage étanche à l'eau, tel que l'oxyde ou le fluorure de silicium. On mélange ensuite les particules de phosphore enrobées avec une matière non durcissable, à raison d'une proportion donnée. Dans les formulations caractéristiques cette proportion est comprise entre 0,1 et 30 pour-cent en volume de particules.

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