Low aberration field emission electron gun

H - Electricity – 01 – J

Patent

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Details

H01J 29/56 (2006.01) H01J 3/02 (2006.01) H01J 37/073 (2006.01)

Patent

CA 2061160

A field emission source is used in conjunction with a three element asymmetric lens system to provide an electron gun having greater magnitude beam currents focused on a smaller spot size than has been previously possible for intermediate energy beams. The three element asymmetric lens system has a lower spherical aberration than prior art electrostatic guns and a very low chromatic aberration coefficient, enabling precise focusing of beams with large currents and energy spreads. The electron gun produces high current densities in beams focused on small spot areas, despite the relatively large acceptance angle and energy spread of the source beams.

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