Low concentration trivalent chromium electroplating solution...

Details Low concentration trivalent chromium electroplating solution... Low concentration trivalent chromium electroplating solution...

C - Chemistry, Metallurgy

25

D

204/35

C25D 3/06 (2006.01) C25D 5/14 (2006.01)

Patent

CA 1150185

ABSTRACT A very low concentration (below 0.03 M) trivalent chromium plating bath in which the source of chromium is an equilibrated aqueous solution of a chromium (III) - thiocyanate complex gives a deposit of unexpectedly light colour. Such a bath is employed to produce thin overcoatings of light coloured chromium for decorative applications. The bath and process is also used to plate the initial layer of a thick (greater than 5 micron) deposit for engineering applications, the major part of which is plated from a higher chromium concentration bath. Such thick deposits from a higher concentration bath are more cohesive and smoother when plated over an initial layer from the low concentration bath.

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