C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
204/96.1, 204/96
C23C 14/14 (2006.01) C22C 29/02 (2006.01) C22C 29/16 (2006.01) C23C 14/06 (2006.01) C23C 14/16 (2006.01) C23C 14/34 (2006.01) H01H 1/023 (2006.01)
Patent
CA 1263217
LOW CONTACT ELECTRICAL RESISTANT COMPOSITION SUBSTRATES COATED THEREWITH, AND PROCESS FOR PREPARING SUCH ABSTRACT OF THE DISCLOSURE A composition of a metallic compound represented by the formula MT, and G is provided by sputtering an MxG100-x target. M is a metal selected from the group of titanium, hafnium, zirconium, and mixtures thereof. T is selected from the group of N, C, and mixtures thereof. G is a metal selected from the group of gold, platinum, and palladium. X is an integer from about 65 to about 95. Also provided are substrates coated with the composition and process for depositing the composition on substrates.
533596
Cuomo Jerome J.
Dibble Eric P.
Levine Solomon L.
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