Low contact electrical resistant composition, substrates...

C - Chemistry – Metallurgy – 23 – C

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204/96.1, 204/96

C23C 14/14 (2006.01) C22C 29/02 (2006.01) C22C 29/16 (2006.01) C23C 14/06 (2006.01) C23C 14/16 (2006.01) C23C 14/34 (2006.01) H01H 1/023 (2006.01)

Patent

CA 1263217

LOW CONTACT ELECTRICAL RESISTANT COMPOSITION SUBSTRATES COATED THEREWITH, AND PROCESS FOR PREPARING SUCH ABSTRACT OF THE DISCLOSURE A composition of a metallic compound represented by the formula MT, and G is provided by sputtering an MxG100-x target. M is a metal selected from the group of titanium, hafnium, zirconium, and mixtures thereof. T is selected from the group of N, C, and mixtures thereof. G is a metal selected from the group of gold, platinum, and palladium. X is an integer from about 65 to about 95. Also provided are substrates coated with the composition and process for depositing the composition on substrates.

533596

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