Low-loss waveguide and method of making same

Details Low-loss waveguide and method of making same Low-loss waveguide and method of making same

G - Physics

02

B

G02B 6/12 (2006.01) G02B 6/122 (2006.01) G02B 6/13 (2006.01) G02B 6/132 (2006.01)

Patent

CA 2423076

A method of reducing the scattering losses that involves smoothing of the core/cladding interface and/or change of waveguide geometry in high refractive index difference waveguides. As an example, the SOI-based Si/SiO2 waveguides are subjected to an oxidation reaction at high temperatures, after the waveguide patterning process. By oxidizing the rough silicon core surfaces after the patterning process, the core/cladding interfaces are smoothened, reducing the roughness scattering in waveguides.

Cette invention a trait à un procédé permettant de réduire les pertes par dispersion, consistant à lisser l'interface coeur/gaine et/ou à modifier la géométrie du guide d'onde dans des guides d'onde à forte différence d'indice de réfraction. On soumet, par exemple, dans le cadre de ce procédé, des guides d'onde au Si/SiO¿2? à base de silicium sur isolant, à une réaction d'oxydation à des températures élevées et ce, à la suite du processus de configuration du guide d'onde. Le fait d'oxyder les surfaces rugueuses du coeur en silicium après le processus de configuration permet de lisser les interfaces coeur/gaine, ce qui diminue la dispersion due à la rugosité.

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