Low molecular weight (meth) acrylic polymers free of...

C - Chemistry – Metallurgy – 08 – F

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C08F 2/06 (2006.01) C08F 20/18 (2006.01) C08L 1/18 (2006.01) C08L 33/08 (2006.01) C08L 33/10 (2006.01) C10M 145/14 (2006.01) C10L 1/196 (2006.01)

Patent

CA 2756415

The subject matter of the invention is (meth)acrylic polymers comprising a linear or branched C8, or more, fatty chain that may comprise at least one ethylenic unsaturation, which have a weight-average molecular mass (formula I) of less than 20 000 g/mol, which are free of sulphur-containing, metallic and halogenated compounds and the degree of residual monomers of which, measured by GPC, is less than or equal to 10% by mass, preferably less than or equal to 7% by mass. The subject matter of the invention is also the process for synthesizing said polymers and the use of said polymers.

L'invention a pour objet des polymères (méth)acryliques à chaîne grasse linéaire ou ramifiée en C8 ou plus pouvant comporter au moins une insaturation éthylénique, de masse moléculaire moyenne en poids (formule I) inférieure à 20.000 g/mole, exempts de composés soufrés, métalliques et halogènes et dont le taux de monomères résiduels mesuré par GPC est inférieur ou égal à 10 % massique, de préférence inférieur ou égal à 7% massique. L'invention a encore pour objet le procédé de synthèse et leur utilisation.

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